Southern Utah Photography Workshop
with Lynn Radeka and Ron Gaut
Little Wild Horse Canyon, San Rafael Swell, UT.
Copyright © Lynn Radeka.
New Mexico Photography Workshop
with Lynn Radeka and Fred Newman
Shiprock and Storm, 1997. Shiprock, NM.
Copyright © Lynn Radeka.
Death Valley Photography Workshop
with Lynn Radeka and Ron Gaut
Dunes, Sunrise #2, 2015. Death Valley National
Copyright © Lynn Radeka.
from previous workshop attendees
Contrast Masking Workshops
Private workshops designed for 1 to 4 participants, available throughout
the year to fit YOUR schedule.
Group workshops for up to 4 participants coming again soon due to
Register for 2019 Contrast Masking Workshops
Experience the excitement and ease of Contrast
Masking to achieve remarkable print quality firsthand!
Taught by Lynn Radeka with visits and demonstrations
by masking guru Dr. Dennis McNutt. This informal and enjoyable
workshop will take the "mystique" out of contrast masking.
Fine-tuning your prints to fulfill your visualization will become
an exciting reality. Learn to easily make a variety of valuable
and powerful contrast masks effortlessly and quickly, using inexpensive
films and developers. The use of a densitometer is not needed,
as this workshop stresses the use of contrast masking as an art
in itself. The potential for improving your print quality is enormous!
Instructors Dr. Dennis McNutt,
Lynn Radeka and Steve Francis
at the October, 2005 workshop. Photo by Roy Pope.
Dr. Dennis McNutt, Chauncey Bayes and Lynn Radeka
at a 2012 Orange Coast College Photography Contrast Masking demonstration
and lecture series.
These unique contrast masking photography
workshops will stress the making and use of an array of different
contrast masks to improve and enhance black and white print
quality. Lynn Radeka with Ron Gaut (with guest visits by masking-master
Dr. Dennis McNutt) will be teaching and demonstrating various
techniques of making and using several types of contrast masks
such as the Unsharp Mask, the Contrast Reduction Mask, Shadow
Contrast Increase Masks, Highlight Masks, Dodge Masks and Fog
Masks. Students will view comparison prints showing the profound
improvements that masks can make in actual prints. Using participant's
negatives, as well as Lynn's original negatives, appropriate
masks will be determined and made under Lynn's guidance. Afterwards,
participants will make prints from those masked negatives and
discuss the improvements in print quality. The Precision
pin-registration carrier system in Lynn's enlarger
will be used for all masking and printing demonstrations. Fine-tuning
masks using a variety of techniques including Lynn's highlight-brightener
formula will also be taught and demonstrated.
This intensive and enjoyable workshop
will be limited to only four participants so that maximum attention
can be given to each individual. Each participant will be given
a signed poster and a workshop booklet. This workshop will be
held in Lynn Radeka's darkroom in southern California. Photographer
Ron Gaut will assist Lynn at some of these workshops.
Lynn hopes to make this the ultimate
multi-participant contrast masking workshop, teaching in-depth
techniques that no other workshops even approach. With these
exciting tools in the photographer's arsenal, achieving the
"ultimate" fine print will become an exciting reality
instead of an impossible task. We recommend that all applicants
have at least a little basic experience in Black and White darkroom
work. This workshop is primarily geared toward medium and large
format photography but those shooting small format are welcome
as well. All demonstrations will be given using 4x5 negatives.
Participants are encouraged to bring original negatives in 4x5
format if possible (or 5x7 and 8x10 formats if the participant
wishes to learn masking for contact prints), as well as prints
and/or test strips, but are not required to do so.
As of this writing (March 2018) only
private 1-on-1 workshops are available. Group workshops (2 or
moe participants) can be arranged at your request. The normal
group workshops (for up to 4 participants) will be returning
on a regular schedule soon. Please notify Lynn Radeka about
CONTRAST MASKING WORKSHOP INSTRUCTORS
|Lynn has been
traveling and photographing the American West since the late
1960's. He has a number of books to his credit including Ghost
Towns of the Old West, Historic Towns of America, Forts and
Battlefields of the Old West and Great American Hotels.
Lynn was commissioned by Smithmark Publications in the 1990's
to make 8x10 prints from Ansel Adams' negatives under the ownership
of the Library Of Congress for the large format book Master
Of Light: Ansel Adams and His Influences. He is also featured
in the recent book World's Top Photographers: Landscape.
Lynn's black and white work has been published in books and
calendars. Posters of Lynn's photographs have been displayed
and sold in America's National Parks since the mid-1980's. Lynn
is the co-author of the Contrast Masking Kit manual and
has been conducting Contrast Masking Workshops since 2005..
has been in the photographic scene for decades. He is an inventor
of all kinds of techniques and devices and an outstanding photographer
often using an 8x10 camera to capture his images in the field.
Along with photographer Mark Jilg, Dennis researched the methods
for altering tonal relationships in the traditional film-based
darkroom and wrote the original articles for three prominent
contrast masking techniques: Contrast Reduction Masks, Highlight
Masks and Shadow Contrast Increase Masks. These remarkable methods
have greatly influenced the work of photographers throughout
the world including the other instructors at this workshop -
Aaron Pazanti and Lynn Radeka. Dennis has a unique ability to
explain even the most difficult concepts in easy to understand
ways. We are honored to have Dennis as a guest speaker at the
Contrast Masking Workshops.
Ron Gaut discovered the outdoors at
an early age and developed a deep passion for wilderness and
photography. Not surprising, with Ron's 30-year engineering
background and thirst to learn about photographic processes,
in the early 1990's he began to experiment with many different
films, developers, silver papers and alternative processes.
He quantified much of his work by sensitometric analysis to
determine the film/developer and paper/developer combination
properties for different film and paper development methods,
submitting the results as thesis papers at a local college.
Ron was Influenced in his early work
by Ansel Adams, John Sexton, Lynn Radeka, Ray McSavaney, and
other contemporary "west coast" landscape masters.
Private one-on-one photography
workshops with Lynn Radeka are now available. These popular
workshops offer the beginning, intermediate and advanced
photographer lessons in contrast
masking, zone system
or general photographic techniques
and are designed to suit each individual's
interest or level of experience. Two person workshops may
be available at a reduced hourly cost per person but depend
upon availability and scheduling. Reduced hourly rates may
be available if scheduling ten or more hours. Please call
or e-mail for information.
For students and professional
photographers alike, this is the workshop to attend for
the utmost in personal attention. This workshop is tailored
to the individual's experience and the material covered
depends solely on the participants interests. It is the
most in-depth instruction possible.
Students may participate
in masking and printing their own negatives in Lynn's darkroom
under his guidance, or may observe Lynn masking and printing
his negatives. Students determine exactly which procedures/processes
they wish to learn, and at what pace they feel most comfortable
with. The Precision Pin-Registration
Carrier System will be demonstrated and used for all
printing and mask-making procedures.
Masking or General Photography Workshops
Location: Lynn Radeka's darkroom
in southern California
Fee: $100 per hour, with a minimum of 4 hours per session.
Payment required at end of each session or in advance
if you wish..
Hours: Any - depending upon availability. Please schedule
with Lynn in advance.
Materials to bring: Pencil and paper, sample prints
(if desired), original negatives (if desired) of either 2
1/4 or 4x5 format (preferred).
Contact: Lynn Radeka via e-mail
to reserve a space.
For more information on Contrast masking, Contrast Masking Kits,
or Precision pin-registration systems please visit Maskingkits.com
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